Xref: utzoo comp.windows.x:3036 comp.windows.news:441 Path: utzoo!mnetor!uunet!husc6!bbn!mit-eddie!ll-xn!ames!pasteur!dent.Berkeley.EDU!davidh From: davidh@dent.Berkeley.EDU (David S. Harrison) Newsgroups: comp.windows.x,comp.windows.news Subject: Re: NeWS or X - which to choose? Message-ID: <2420@pasteur.Berkeley.Edu> Date: 15 Apr 88 21:35:50 GMT References: <14279@hc.DSPO.GOV> Sender: news@pasteur.Berkeley.Edu Reply-To: davidh@ic.Berkeley.EDU Followup-To: comp.windows.x, comp.windows.news Organization: UC Berkeley CAD Lab Lines: 28 Keywords: NeWS, X, Summary Last time I saw a message similar to this I posed a few questions to the comp.windows.news group about operations I feel are essential for engineering graphics that don't seem to be possible in NeWS. I have received no responses or feedback. Once again, I would 1. Raster operations other than copy or xor. 2. Color map modifications to directly specify a color. 3. Plane management (masks) for independent control of multiple planes. 4. Stipple fill of rectangular and non-rectangular regions on *color* devices (this is NOT the same as tiling with an or operation). The stipple must be interlocked (relative to a known point regardless of the location of the stippled object). I have written an editor for Computer-Aided Design of Integrated Circuits under X10 which uses *ALL* of these features. Furthermore, most CAD of IC graphics editors I know of require most if not all of these features. As far as I can tell, these editors cannot run on top of NeWS. David Harrison UC Berkeley Electronics Research Lab (davidh@ic.Berkeley.EDU, ...!ucbvax!ucbcad!davidh)