Path: utzoo!utgpu!jarvis.csri.toronto.edu!mailrus!wuarchive!zaphod.mps.ohio-state.edu!uakari.primate.wisc.edu!caesar.cs.montana.edu!ogicse!decwrl!ucbvax!hplabs!hp-pcd!hpcvlx!tay From: tay@hpcvlx.cv.hp.com (Mike Taylor) Newsgroups: comp.windows.x Subject: Re: Quality of Motif courses Message-ID: <100920193@hpcvlx.cv.hp.com> Date: 13 Mar 90 00:20:43 GMT References: <3052@jato.Jpl.Nasa.Gov> Organization: Planet X Lines: 22 >We're considering sending a couple of people to one of the various Motif >courses being offered. Two that we are considering are Data General's >three day course, and ICS's five day course. > >Anyone taken either of these? Any and all comments appreciated. I will >summarize to the net if demand/response is evident. I cannot comment on the Data General course, but you may consider contacting a local HP sales rep for information pertaining to the HP Motif course. The material was developed by three support development engineers in my group and was sold to OSF who in turn sold it to various vendors, including ICS. I do not know what course ICS is currently presenting, but the material developed for OSF is five days of lab-intensive (about 20 labs) training that covers all of the basics. Each lab builds upon the previous. The material was also reviewed by several of the engineers who developed the OSF/Motif toolkit. It is of very high quality. Mike Taylor ITO Technical Support Hewlett-Packard